Keyword(s): Journal: Year: Author:

EUVL Compatible, LER Solutions using Functional Block Copolymers

Journal: Alternative Lithographic Technologies Iv     Year: 2012     Issue: -     Pages: -
Authors: H. H. Cheng, I. Keen, A. G. Yu, Y. M. Chuang, I. Blakey, K. S. Jack, M. J. Leeson, T. R. Younkin, K. W. Andrew, W. M. Tong and D. J. Resnick

EUVL Compatible, LER Solutions using Functional Block Copolymers

Journal: Alternative Lithographic Technologies Iv     Year: 2012     Issue: -     Pages: -
Authors: H. H. Cheng, I. Keen, A. G. Yu, Y. M. Chuang, I. Blakey, K. S. Jack, M. J. Leeson, T. R. Younkin, K. W. Andrew, W. M. Tong and D. J. Resnick